From a97ee50d35b1680925f0c0363de84937d373e219 Mon Sep 17 00:00:00 2001
From: =?utf8?q?Micha=C5=82=20G=C3=B3rny?= <mgorny@gentoo.org>
Date: Wed, 3 Apr 2019 10:53:23 +0200
Subject: [PATCH] package.mask: Last rite dev-lang/polyml
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Signed-off-by: Michał Górny <mgorny@gentoo.org>
---
 profiles/package.mask | 6 ++++++
 1 file changed, 6 insertions(+)

diff --git a/profiles/package.mask b/profiles/package.mask
index bf7bf32edcb1..3031dfc4e2b5 100644
--- a/profiles/package.mask
+++ b/profiles/package.mask
@@ -29,6 +29,12 @@
 
 #--- END OF EXAMPLES ---
 
+# Michał Górny <mgorny@gentoo.org> (03 Apr 2019)
+# Does not build against libffi-3.3.  Also other unsolved build failures
+# (#619662, #606096).  Needs version bump for almost 2 years.
+# Removal in 30 days.  Bug #667476.
+dev-lang/polyml
+
 # Michał Górny <mgorny@gentoo.org> (03 Apr 2019)
 # Depends on dev-lang/polyml that no longer builds.  The current version
 # is two years old, and needs a bump for 1.5 year.
-- 
2.26.2