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profiles/base: Mask <sys-devel/llvm-9[doc]
author
Michał Górny
<mgorny@gentoo.org>
Tue, 24 Mar 2020 20:50:44 +0000
(21:50 +0100)
committer
Michał Górny
<mgorny@gentoo.org>
Tue, 24 Mar 2020 21:46:03 +0000
(22:46 +0100)
Signed-off-by: Michał Górny <mgorny@gentoo.org>
profiles/base/package.use.mask
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diff --git
a/profiles/base/package.use.mask
b/profiles/base/package.use.mask
index 89474280ace19b19dc683fa730fb035572fb92bf..4bc1e23959eba28a7a4a1d541fd59729f45bf002 100644
(file)
--- a/
profiles/base/package.use.mask
+++ b/
profiles/base/package.use.mask
@@
-6,6
+6,10
@@
# This file is only for generic masks. For arch-specific masks (i.e.
# mask everywhere, unmask on arch/*) use arch/base.
+# Michał Górny <mgorny@gentoo.org> (2020-03-24)
+# Require dev-python/recommonmark with py2.
+<sys-devel/llvm-9 doc
+
# Georgy Yakovlev <gyakovlev@gentoo.org> (2020-03-18)
# USE=doc makes rust compile 6 times!
# Reason unknown yet, masking for now.